发明名称 THIN-FILM CAPACITOR
摘要 PROBLEM TO BE SOLVED: To provide a thin-film capacitor wherein copper and its oxide that are inexpensive and have high conductivity are used for electrode material and stress in the manufacturing process is relaxed. SOLUTION: In a thin-film capacitor wherein an electrode 11, a dielectric layer 21 and an electrode 12 are laminated on a substrate 1, a composite material of copper and cuprous oxide is used for the electrodes 11 and 12. As a result, the stresses generated in the manufacturing process between the substrate 1 and the electrode 11 and between the electrodes 11 and 12 and the dielectric layer 21 are relaxed and the generation of cracks and peelings and the like can be reduced.
申请公布号 JP2001185443(A) 申请公布日期 2001.07.06
申请号 JP19990363880 申请日期 1999.12.22
申请人 HITACHI LTD 发明人 IWANAGA TOMOHISA
分类号 H01G4/33;H01G4/008;(IPC1-7):H01G4/33 主分类号 H01G4/33
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