PHASE SHIFT MASK AND MANUFACTURING METHOD THEREOF

摘要

PURPOSE: A method for manufacturing a phase shift mask is provided to prevent light from being projected on the side surface of a phase shift layer, by forming a non-reflecting layer of a spacer shape on the side surface of the phase shift layer. CONSTITUTION: A phase shift material layer and a chrome layer are sequentially formed on a quartz substrate(11). The chrome layer is patterned to form chrome patterns. The phase shift material layer is etched by using the chrome patterns as an etching mask to form a phase shift layer(12) of a pattern shape. The chrome patterns are removed. A non-reflecting layer(13) is deposited on the phase shift layer and the quartz substrate. The non-reflecting layer is etched to make the non-reflecting layer being left on the side surface of the phase shift layer as a spacer shape.