发明名称 SHADOW MASK SUPPORTING APPARATUS FOR MAGNETIC FORCE VACUUM DEPOSITION
摘要 PURPOSE: A shadow mask supporting apparatus for magnetic force vacuum deposition is provided to get an accurate circuit pattern by using magnetic force to support closely shadow mask at glass. CONSTITUTION: An upper plate(11) and a support plate(15) faces each other and is separated a designated interval. A several magnetic force generating part(53), which is wound with a coil(49), is inserted between the upper plate(11) and the support plate(15). The upper plate(11) and the support plate(15) have a same plane shape, and a support member(25) supplies inside space to the edge part. The support member(25) has a shape of the edge of the upper plate(11) or the support plate(15), and is formed vertically with a several bolt hole(31) and an installation opening(27). The support member(25) has a designated height, and combines the upper plate(11) and the support(15) to be separated with parallel and a designate interval, and then supports a magnetic force generator(53) strongly.
申请公布号 KR20010057828(A) 申请公布日期 2001.07.05
申请号 KR19990061239 申请日期 1999.12.23
申请人 ANS INC. 发明人 CHOI, DONG GWON;CHOI, SANG HWA;LEE, JAE GYEONG;OH, GYU UN
分类号 H01J29/02;(IPC1-7):H01J29/02 主分类号 H01J29/02
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