VERTICAL DIFFUSION FURNACE FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PURPOSE: A vertical diffusion furnace for manufacturing a semiconductor device is provided to supply uniformly a gas to each wafer by forming an exhausting portion on a slot portion supporting the wafer. CONSTITUTION: A heater portion(50) forms an outer body. A reaction tube(60) is installed at an inside of the heater portion(50). The reaction tube(60) has an exhaust portion for exhausting a supplied gas. A boat(80) is installed at an inside of the reaction tube(60). The boat(80) has an upper plate(81), a lower plate(83), and a multitude of support bar(85). The support bars(85) are installed between the upper plate(81) and the lower plate(83). Slots for supporting edges of wafers are formed on the support bars(85). A guide path(85b) is formed on the boat(80) in order to guide a gas to the reaction tube(60). A boat cap(90) is formed to load the boat(80). A gas inflow path(91) is formed on the boat cap(90).