发明名称 |
SUBSTRATE HOLDING CHUCK |
摘要 |
PURPOSE: A substrate holding chuck is provided to prevent the defect and spot of a substrate by removing a water remaining on the surface thereof from a cleaning process to a drying process of deionized water. CONSTITUTION: A chuck arms(10) holds the side end of a substrate(30). A nitrogen nozzle(40) has a plurality of spraying hole formed in order directing to the surface of the substrate(30). A nitrogen supplying unit is a mobile route supplying a nitrogen to the inside of the nitrogen nozzle(40). The farther spraying hole goes on from the entrance to the exit thereof the larger the diemeter of the hole become. A plurality of chuck loads(20) contacting the side of the substrate(30) is installed on the inner side of the chuck arm(10).
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申请公布号 |
KR20010055529(A) |
申请公布日期 |
2001.07.04 |
申请号 |
KR19990056745 |
申请日期 |
1999.12.10 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
BAEK, IN HAK |
分类号 |
H01L21/68;(IPC1-7):H01L21/68 |
主分类号 |
H01L21/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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