发明名称 |
Method and device for measuring the thickness of thin films near a sample's edge and in a damascene-type structure |
摘要 |
A method for measuring a structure that contains overlying and underlying films in a region where the overlying film's thickness rapidly decreases until the underlying film is exposed (e.g., an edge-exclusion structure). The method includes the steps of: (1) exciting acoustic modes in a first portion of the region with at least one excitation laser beam; (2) detecting the acoustic modes with a probe laser beam that is either reflected or diffracted to generate a signal beam; (3) analyzing the signal beam to determine a property of the structure (e.g., the thickness of the overlying layer) in the first portion of the region; (4) translating the structure or the excitation and probe laser beams; and (5) repeating the exciting, detecting, and analyzing steps to determine a property of the structure in a second portion of the region.
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申请公布号 |
US6256100(B1) |
申请公布日期 |
2001.07.03 |
申请号 |
US19980067411 |
申请日期 |
1998.04.27 |
申请人 |
ACTIVE IMPULSE SYSTEMS, INC. |
发明人 |
BANET MATTHEW J.;FUCHS MARTIN;ROGERS JOHN A. |
分类号 |
G01B11/06;H01L21/66;(IPC1-7):G01N21/84 |
主分类号 |
G01B11/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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