发明名称 Selective wafer-level testing and burn-in
摘要 Selective electrical connections between an electronic component and a test substrate are made using an electrical conductive material. The conductive material of the present invention is a dissolvable material, allowing for rework and repair of a wafer at the wafer-level, and retesting at the wafer-level. In addition, the conductive material may also be used in a permanent package, since the conductive material of the present invention provides complete electrical conductivity and connection between the electronic component and the substrate.
申请公布号 US6255208(B1) 申请公布日期 2001.07.03
申请号 US19990236927 申请日期 1999.01.25
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BERNIER WILLIAM EMMETT;BERTIN CLAUDE LOUIS;BHATT ANILKUMAR CHINUPRASAD;GAYNES MICHAEL ANTHONY;HEDBERG ERIK LEIGH;MURDESHWAR NIKHIL M.;PIERSON MARK VINCENT;TONTI WILLIAM R.;TOTTA PAUL A.;VAN HORN JOSEPH JOHN;ZALESINSKI JERZY MARIA
分类号 H01L21/60;(IPC1-7):H01L21/44 主分类号 H01L21/60
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