| 摘要 |
PROBLEM TO BE SOLVED: To provide plasma treatment equipment capable of generating a plasma having large area and uniform in a radial direction on the downstream side near the substrate to be treated, by using a specific internal structure of an upper electrode and a superior magnetic field. SOLUTION: In the plasma treatment equipment having a capacitively coupled parallel electrode structure with an internal surface exposed to plasma, the internal surface of an upper electrode 11 has a plasma confinement structure having a plasma confinement region 22. A high density plasma is produced in the region 22, and an RF electric power is applied to the upper electrode 11. The plasma is produced within the plasma confinement region in the vicinity of the upper electrode 11 and allowed to diffuse toward a substrate 19. The plasma produced within the plasma confinement region has high density because of the plasma confining action and the plasma of large area is in a state of a plasma density nonuniform in radial direction and has a plasma density uniform in radial direction on the downstream side. |
