发明名称 |
MODIFIED ILLUMINATION APPARATUS OF LITHOGRAPHY APPARATUS |
摘要 |
PURPOSE: A modified illumination apparatus of a lithography apparatus is provided to form a modified illumination light without energy loss of the illumination light. CONSTITUTION: If a birefringent optical unit(566) is inserted between a light beam enlarger(565) and a zoom lens(567), an incident light(564) is separated into four beams(575), and the four separated beams forms a quadruple modified illumination light(569) on a position of a modified illumination plane located on a Fly's Eye integrator(568). Also, the position of the birefringent optical unit can be located between an illumination light source(563) and the light beam enlarger. The quadruple modified illumination light is reflected by a reflection mirror(570) and is converged to a mask via a condenser lens(571), and can be transferred to a wafer(574) by a transparent optical system(573).
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申请公布号 |
KR20010053689(A) |
申请公布日期 |
2001.07.02 |
申请号 |
KR19990054156 |
申请日期 |
1999.12.01 |
申请人 |
KOREA ELECTRONICS & TELECOMMUNICATIONS RESEARCH INSTITUTE |
发明人 |
JUNG, HAE BIN;KIM, DAE YONG;KIM, DO HUN |
分类号 |
H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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