发明名称 METHOD FOR MEASURING FILM THICKNESS OF OPTICAL ELEMENT AND METHOD FOR MANUFACTURING THE ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a method for accurately measuring the film thickness of an optical element by using measuring equipment, even when measured value deteriorates due to the resolution of the measuring equipment, and the accurate measurement cannot be conducted. SOLUTION: Film thickness is calculated through the fitting of spectral permeability calculated assuming film thickness and measured spectrum permeability. At this time, the calculated spectrum permeability is corrected by sensitivity characteristics indicating the resolution of spectrum permeability measuring equipment, so that the corrected spectrum permeability to be actually observed can be calculated, and that the film thickness can be calculated by the fitting of the corrected spectrum permeability and the measured spectrum permeability. Thus, the film thickness can be calculated accurately, regardless of the resolution of the measuring equipment.
申请公布号 JP2001174226(A) 申请公布日期 2001.06.29
申请号 JP19990360788 申请日期 1999.12.20
申请人 NIKON CORP 发明人 OKAMOTO MIKIO;AKIYAMA TAKAYUKI;HAGIWARA MAYUMI
分类号 B05D3/00;G01B11/06;G02B1/11;(IPC1-7):G01B11/06 主分类号 B05D3/00
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