发明名称 EPITAXIAL COMPOSITE STRUCTURE AND ELEMENT UTILIZING THE SAME
摘要 PROBLEM TO BE SOLVED: To obtain an epitaxial composite structure at least having a crystal structure in which the thin film of a simple perovskite type crystal is epitaxially grown on a fluorite-type crystal so as to form (011) orientation, and useful as a crystalline material for forming an element having a high performance and reliability, and capable of being highly integrated, and further to provide a ferroelectric element and a superconductor element by utilizing the structure. SOLUTION: This epitaxial composite structure has the thin film of the simple perovskite type crystal epitaxially grown in (011) orientation on the fluorite-type crystal in the (001) orientation. Preferably, the epitaxial composite structure has the thin film comprising the simple perovskite type crystal epitaxially grown in the (011) orientation on the fluorite-type crystal in the (001) orientation, and a laminar perovskite structure epitaxially grown thereon.
申请公布号 JP2001172100(A) 申请公布日期 2001.06.26
申请号 JP19990354889 申请日期 1999.12.14
申请人 NATL INST OF ADVANCED INDUSTRIAL SCIENCE & TECHNOLOGY METI 发明人 UDA SHINJI;SAKAI SHIGEKI
分类号 H01L27/105;C30B23/02;C30B29/32;H01B12/06;H01L21/20;H01L21/8242;H01L21/8246;H01L27/10;H01L27/108;H01L39/24;H01L43/10 主分类号 H01L27/105
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