发明名称 Multiple-cell source of uniform plasma
摘要 A multiple-cell plasma source consists of a pair of perforated plate-like cathodes and a perforated plate-like anode between the both cathode plates. Perforations in all three plates are coaxial and form a plurality of cells in which a Penning discharge plasma is generated due to the passage of axial components of the magnetic field through the individual cells. Since in all cells the plasma flow components are generated and work independently, there are no limitations for an increase in the surface area of the upper cathode plate, which has plasma emitting holes, so that the plasma source can treat objects of a large surface area. The plasma source of the invention has various means for controlling and adjusting the plasma pattern, distribution, parameters, and shape.
申请公布号 US6250250(B1) 申请公布日期 2001.06.26
申请号 US19990272646 申请日期 1999.03.18
申请人 MAISHEV YURI;RITTER JAMES;VELIKOV LEONID;SHKOLNIK ALEXANDER 发明人 MAISHEV YURI;RITTER JAMES;VELIKOV LEONID;SHKOLNIK ALEXANDER
分类号 H01J37/32;(IPC1-7):C23C16/00 主分类号 H01J37/32
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