发明名称 Apparatus and method for treating substrates
摘要 An apparatus and method for cooling substrates is disclosed wherein the apparatus contains a cooling mechanism having a cooling plate, components for circulating a cooling fluid through the cooling plate, a positioning mechanism which positions the substrate relative to the cooling plate during operation of the apparatus and a housing for containing the cooling mechanism, the positioning components and the circulating components. The cooling plate has a non-planar top surface which provides an enlarged surface area used to cool the substrate. The cooling apparatus may be used in conjunction with a larger processing apparatus to fabricate an information storage disk.
申请公布号 US6250374(B1) 申请公布日期 2001.06.26
申请号 US19980218371 申请日期 1998.12.21
申请人 ANELVA CORPORATION 发明人 FUJINO NAOTO;WATANABE NAOKI
分类号 G11B7/26;C23C14/54;F28F13/00;G11B5/84;H01L21/00;(IPC1-7):F28F7/00 主分类号 G11B7/26
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