POSITIVE TYPE RESIST COMPOSITION AND PATTERN FORMING METHOD

摘要

PURPOSE: To provide a positive type resist composition usable for laser light in the vacuum ultraviolet region as a positive type resist composition containing an acrylic resin whose solubility to an alkaline aqueous solution is varied by the action of an acid and further containing an acid generating agent. CONSTITUTION: A polymer containing an acrylic ester or methacrylic ester unit whose ester moiety is a group having a fluorine atom as a constituent unit is used as the acrylic resin.