| 发明名称 |
METHOD FOR PROCESSING SURFACE OF CIRCUIT BOARD |
| 摘要 |
PURPOSE: A method for processing the surface of a circuit board is provided to shorten a substantial interval of time for irradiation, by making a distance between an irradiator and a process surface as short as possible so that radiation can be used at a low price in an intermediate process of a known production line. CONSTITUTION: Radicals or ions are generated by ultraviolet(UV) ray irradiation of a UV ray irradiator(4) like a discharge lamp which is separated from a substrate(1) by a predetermined distance. The UV ray irradiator includes an extended discharge chamber the wall of which is formed of an insulator, filled with gas. At least one electrode is installed on the side surface of the substrate made of an organic or inorganic material.
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| 申请公布号 |
KR20010051736(A) |
申请公布日期 |
2001.06.25 |
| 申请号 |
KR20000068032 |
申请日期 |
2000.11.16 |
| 申请人 |
HERAEUS NOBLELIGHT GMBH |
发明人 |
ARNOLD ERICH;ROTH-FOELSCH ANGELIKA |
| 分类号 |
H01L21/08;B08B7/00;G03F7/42;H01J65/00;H01L21/00;H01L21/027;H01L21/302;H01L21/304;H01L21/3065;(IPC1-7):H01L21/08 |
主分类号 |
H01L21/08 |
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