DOPING-INDEPENDENT SELF-CLEANING ETCH PROCESS FOR POLYSILICON,申请号KR1020017000684-传众专利搜索

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发明名称	DOPING-INDEPENDENT SELF-CLEANING ETCH PROCESS FOR POLYSILICON
摘要
申请公布号	KR20010053548(A)	申请公布日期	2001.06.25
申请号	KR1020017000684	申请日期	2001.01.16
申请人		发明人
分类号	C30B33/12	主分类号	C30B33/12
代理机构		代理人
主权项
地址

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