发明名称 SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a high-speed nonvolatile semiconductor storage device where the rise of both of an interface property between a semiconductor substrate and an insulating layer and a ferroelectric property can be expected, and the dispersion of property is small, and the voltage is low. SOLUTION: This is a semiconductor storage device which has such constitution that the amorphous insulating layer 3, a ferroelectric layer 4 having orientation, and an upper electrode 6 are made in order on a semiconductor substrate 1.
申请公布号 JP2001168214(A) 申请公布日期 2001.06.22
申请号 JP19990347864 申请日期 1999.12.07
申请人 TOSHIBA CORP 发明人 YAMAGUCHI TAKESHI
分类号 H01L21/8247;H01L21/316;H01L21/8246;H01L27/10;H01L27/105;H01L29/788;H01L29/792;(IPC1-7):H01L21/824 主分类号 H01L21/8247
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