| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning method by which, at the time of head cleaning in an atmospheric pressure CVD system, reaction products do not fall on a tray, and the number of cleaning for the tray can be reduced. SOLUTION: In this cleaning method for an atmospheric pressure CVD system provided with a tray carrying mechanism 3, a heater 4, a head 8 storing a gas feed part 5, a gas exhaust part 6 and a nitrogen feed part 7 in one unit and a head elevating/lowering mechanism 9, the head 8 is elevated by the head elevating/lowering mechanism 9, a tray covering means 21 is arranged so as to cover the tray 1, and thereafter, the head 8 is lowered and contacted with the tray covering means 21 or lowered to just before its contact with the head 8. Next, exhaust piping 18 connected to the head 8 is detached, and the an exhaust piping 18 and a connecting port 19 between the head 8 and the exhaust piping 18 are subjected to cleaning. Next, the head 8 is elevated to the top, and reaction products adhered to the lower side of the head 8 are subjected to cleaning.
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