| 摘要 |
A projection-exposing apparatus has a mask which has a pattern formed with a pitch PR, an illuminating optical system for applying illuminating light from a light source to the mask, a projection optical system for projecting an image of the pattern onto a photosensitive substrate, and a deflecting grating member formed with a pitch PG disposed between the light source and the pattern of the mask for generating diffracted light. The pitch PG of the deflecting grating member is defined in the relation PG=2PR. The diffraction grating member is remote from the pattern on the mask by a distance DELTAt, where DELTAt>=PG/2NAIL, NAIL being the numerical aperture of the illumination optical system.
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