| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a clean room for a semiconductor manufacturing device etc. in which a gaseous organic material is absent and to provide a clean room in which a phosphorus compound and a boron compound are absent. SOLUTION: At least a surface material for a wall and a floor constituting the clean room, a filter medium for an air filter and a sealing material to seal the gap between the filter medium and a frame are formed with a material which does not release the phosphorus compound and the boron compound in the air. At least one of the filter medium for the air filter or the sealing material does not generate a gaseous organic material when used.</p> |
