| 摘要 |
PURPOSE: A pattern for checking a critical process in a process for manufacturing a semiconductor device is provided to easily check a state of a previous process, a process defect and a process condition within a short interval of time and in a subsequent process, by forming a process check patterns corresponding to respective critical processes on a plane in a scribe region. CONSTITUTION: A process for manufacturing a semiconductor device includes critical processes such as an isolation process, a process forming an electrode, a process for forming a contact and a via and a process for forming a metal interconnection layer. Patterns for checking processes different from each other according to the respective critical processes are not overlapped in a predetermined region of a scribe line of a semiconductor substrate to check the respective critical processes, having a constant planar disposition.
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