METHOD FOR MEASURING TWO-DIMENSIONAL POTENTIAL DISTRIBUTION IN CMOS SEMICONDUCTOR COMPONENTS,申请号EP19990950492-传众专利搜索

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发明名称	METHOD FOR MEASURING TWO-DIMENSIONAL POTENTIAL DISTRIBUTION IN CMOS SEMICONDUCTOR COMPONENTS
摘要
申请公布号	EP1105742(A1)	申请公布日期	2001.06.13
申请号	EP19990950492	申请日期	1999.07.30
申请人	IHP GMBH	发明人	RAU, WOLF-DIETER
分类号	G01N23/04;G01R31/265;G01R31/307;H01L21/66;H01L21/8238;H01L27/092;H01L29/00;(IPC1-7):G01R31/307	主分类号	G01N23/04
代理机构		代理人
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