发明名称 Field effect transistor having a floating gate
摘要 A field effect transistor which comprises a semiconductor substrate having a source region and a drain region separated by a channel region; a conductive floating gate formed over a first portion of the channel region adjacent to the doped source region and recessed into the semiconductor substrate; and being separated from the first portion of the channel region by a first insulation layer; and a conductive control gate formed substantially over but electrically isolated from the floating gate and formed over the entire channel region; along with a method for fabricating such is provided.
申请公布号 US6245613(B1) 申请公布日期 2001.06.12
申请号 US20000556698 申请日期 2000.04.24
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 HSU LOUIS L.;MANDELMAN JACK A.;HU CHIH-CHUN
分类号 H01L21/28;H01L21/8247;(IPC1-7):H01L21/336 主分类号 H01L21/28
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