发明名称 SEMICONDUCTOR PROCESS EVALUATING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor process evaluating device that can accurately evaluate a device with desired current density. SOLUTION: In the semiconductor process evaluating device for carrying out a conduction test by applying a probe needle on a wafer, a heat sink is formed in the probe needle, in partially scraped so that the tip of the probe needle can be viewed from an upper surface, is set to a radial shape, and at the same time is composed by one or a plurality of metal materials or materials with an excellent heat radiation property.
申请公布号 JP2001159641(A) 申请公布日期 2001.06.12
申请号 JP19990343416 申请日期 1999.12.02
申请人 HITACHI CABLE LTD 发明人 WAJIMA MINEO
分类号 G01R1/067;H01L21/66;(IPC1-7):G01R1/067 主分类号 G01R1/067
代理机构 代理人
主权项
地址
您可能感兴趣的专利