发明名称 HEIGHT MEASURING METHOD AND DEVICE
摘要 PROBLEM TO BE SOLVED: To provide height measuring method and device capable of setting the reference surface as a reference for measuring the height with high accuracy, simplifying the height measurement for a bump and effecting the height measurement with high accuracy. SOLUTION: A laser beam is scanned in two dimensions and applied to the surface of a wafer 3, reflected lights from the bump 2 and the wafer 3 are detected by a light position detecting part 5, a height measurement value of each measuring point is obtained from quantity if received reflected light. A three-dimensional shape diagram corresponding to the measurement values is generated, dispersion of height measurement values of each measuring point in a measurement reference area specified on the three-dimensional shape diagram is determined. When dispersion is a preset dispersion threshold or less, it is adopted as a measurement reference surface, and according to the reference height on the measurement reference surface, the height of the bump 2 is obtained.
申请公布号 JP2001153617(A) 申请公布日期 2001.06.08
申请号 JP19990338423 申请日期 1999.11.29
申请人 OLYMPUS OPTICAL CO LTD 发明人 ISHIKAWA KAZUYUKI;WATANABE NOBUYUKI
分类号 G01B11/02;H01L21/60;H01L21/66;(IPC1-7):G01B11/02 主分类号 G01B11/02
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