发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING SAME, METHOD FOR PRODUCING RESIST PATTERN AND METHOD FOR PRODUCING PRINTED WIRING BOARD
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in adhesion, stripping characteristic and scumming property, a photosensitive element excellent in adhesion, stripping characteristic, scumming property and chemical resistance and in the mechanical characteristics, handleability and work efficiency of a photo-cured body, a method for producing a resist pattern and a method for producing a printed wiring board. SOLUTION: The photosensitive resin composition contains (A) a binder polymer, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated bond in one molecule and (C) a photopolymerization initiator. The component B includes (b-1) a bisphenol A type (meth)acrylate compound and (b-2) a compound of formula I (where R1 is H or methyl; X1 is a 2-6C alkylene; and (m) is an integer of 4-20) as essential components. The photosensitive resin composition is applied, dried and laminated on a substrate to obtain the objective photosensitive element.
申请公布号 JP2001154349(A) 申请公布日期 2001.06.08
申请号 JP19990339048 申请日期 1999.11.30
申请人 HITACHI CHEM CO LTD 发明人 OHASHI TAKESHI;ISHIKAWA TSUTOMU;ISO JUNICHI
分类号 H05K3/06;C08F2/46;C08F220/26;C08F257/02;C08F290/06;C08F291/00;C08F299/02;G03F7/027;G03F7/033 主分类号 H05K3/06
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