Phasenverschiebungsmaske, Verfahren zur Herstellung derselben und Belichtungsverfahren unter Verwendung einer solchen Phasenverschiebungsmaske

摘要

A quartz substrate (1) includes a first light transmitting portion (1a) and a second light transmitting portion (1b) which transmit exposure light. The first and second light transmitting portions (1a and 1b) are formed such that exposure light transmitted through respective light transmitting portions are 180 DEG out of phase with each other. A semi-light shielding film (3) is located between first and second light transmitting portion (1a and 1b) and formed in a part of first and second light transmitting portions (1a and 1b). Also, semi-light shielding film (3) has transmittance of at least 3% and not more than 30%.