发明名称 Method of staining semiconductor wafer samples with a semiconductor treatment chemical
摘要 A method for staining a plurality of semiconductor wafers and wafer samples with a chemical. The method includes gripping first and second semiconductor wafers and orienting the second semiconductor wafer such that it is substantially coplanar with the first semiconductor wafer and suspending the first and second semiconductor wafers such that at least portions thereof extend into the chemical. The method may also include gripping a first semiconductor wafer and a second semiconductor wafer that has a different size from the first and suspending first and second semiconductor wafers such that at least portions thereof extend into the chemical.
申请公布号 US2001003012(A1) 申请公布日期 2001.06.07
申请号 US20000747481 申请日期 2000.12.22
申请人 MARTINI FRANK E. 发明人 MARTINI FRANK E.
分类号 H01L21/00;H01L21/673;(IPC1-7):B05C13/02 主分类号 H01L21/00
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