MASK PATTERN FOR FORMING STEPPED PATTERN PROFILE

摘要

PURPOSE: A mask pattern for forming a stepped pattern profile is provided to maintain excellent step coverage in a metal interconnection process, by making a stepped slope of a photoresist pattern form an inclined pattern. CONSTITUTION: A mask pattern(10) has a permeating part(11), a non-permeating part(12) and a grating part(13). Light from a light source permeates the permeating part of a glass plate. A non-permeating material is coated on the non-permeating part to prevent the light from permeating the non-permeating part of the glass plate. The non-permeating material of an antenna-type structure is formed along a boundary portion between the permeating part and the non-permeating part so that the quantity of permeating light is controlled by a diffraction effect and an interference effect in the grating part.