| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an abrasive liquid supplying device capable of supplying abrasive liquid stably containing an additive to a polishing unit. SOLUTION: The abrasive liquid supplying device for supplying abrasive liquid to a polishing part 12 is provided with a supplying tank 18 for storing abrasive liquid having the specified concentration, an abrasive liquid pipe 46 for feeding the abrasive liquid from the supplying tank to a polishing liquid nozzle 146 of the polishing part, an additive tank 203 for storing an additive having the specified concentration, and an additive pipe 22 for adding the additive to the abrasive liquid from the additive tank to the abrasive liquid supplying tank and at a specified part of an abrasive path including the abrasive liquid pipe.</p> |
