发明名称 PURIFYING APPARATUS OF CHAMBER
摘要 PURPOSE: A purifying apparatus of a chamber is to smoothly discharge exhaust gas even when a gas cleaning device is out of order, thereby always maintaining the chamber in a normal state. CONSTITUTION: A gas cleaning device(44A,44B) discharges exhaust gas of a chamber to an outside. A back-up gas cleaning device(54) discharges the exhaust gas of the chamber to the outside according to change of discharging pressure of the gas cleaning device. A discharge controlling portion closes a discharging pipe between the chamber and the gas cleaning device, and opens a discharging pipe between the chamber and the back-up gas cleaning device when detecting the change of the discharging pressure of the gas cleaning device. The discharging pipes between the chamber and the gas cleaning device, and the chamber and the back-up gas cleaning device are disposed in parallel. The first discharging valve(58A,58B,58C,58D) is disposed at the discharging pipe between the chamber and the gas cleaning device to open/close the pipe. The second discharging valve(58A',58B',58C'58D') is disposed at the chamber and the back-up gas cleaning device to open/close the pipe.
申请公布号 KR20010045442(A) 申请公布日期 2001.06.05
申请号 KR19990048735 申请日期 1999.11.05
申请人 LG.PHILIPS LCD CO., LTD. 发明人 KWON, O SEON
分类号 G02F1/13 主分类号 G02F1/13
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