发明名称 |
Method and apparatus for cleaning harmful gas by irradiation with gas laser and electron beams |
摘要 |
An apparatus for reducing harmful ingredients in gas by irradiating the gas with an electron beam. The apparatus comprising a voltage generating unit adapted to generate a high-frequency and high voltage signal, and a reaction unit coupled to the voltage generating unit to receive the high-frequency and high voltage signal, the reaction unit including an electron beam pole having a plurality of openings along the surface of the electron beam pole, and a plurality of discharge cells for each opening, the discharge cells being disposed to face the corresponding opening for generation of the electron beam therebetween, the region between the discharge cells and the openings defining a reaction region through which the gas travels. |
申请公布号 |
US2001002242(A1) |
申请公布日期 |
2001.05.31 |
申请号 |
US20010758383 |
申请日期 |
2001.01.12 |
申请人 |
LEE YONG HEE;PARK JIN KYU;PARK JIN HO |
发明人 |
LEE YONG HEE;PARK JIN KYU;PARK JIN HO |
分类号 |
B01D53/34;B01D53/32;B01D53/38;B01D53/60;B01D53/74;B01J19/08;F01N3/08;H05H1/24;(IPC1-7):H02K3/00;H02K19/26;B01J19/12 |
主分类号 |
B01D53/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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