| 摘要 |
PROBLEM TO BE SOLVED: To provide a drawing method applicable to an ordinary drawing system using a positive resist and drawing patterns by irradiating the portions where there is no pattern data with an electron beam or laser beam in the drawing method for a photomask with the additional patterns provided with the additional patterns for making the pattern density of the photomask uniform and to provide a method for forming the pattern data used therefor. SOLUTION: The drawing method applicable to the drawing system using the positive resist and drawing the patterns by irradiating the portions where there is no pattern data with the electron beam or laser beam is provided in the drawing method for the photomask with the additional patterns provided with the additional patterns for making the pattern density of the photomask uniform. The method for forming the pattern data, which is dealable not only with wiring layers but with other processing layers, such as polysilicon layers, as well and does not require an enormous processing time, is provided in a data processing method for forming the drawing data used in this drawing method. |
