发明名称 |
Method of forming a shallow trench isolation structure |
摘要 |
This invention provides a concave shallow trench isolation structure, and a fabricating method of a shallow trench isolation structure with concave bottom corners. The concave shape of the structure prevents stress centralization, and avoids leakage current or punch through in the source/drain regions.
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申请公布号 |
US6238996(B1) |
申请公布日期 |
2001.05.29 |
申请号 |
US19990236951 |
申请日期 |
1999.01.25 |
申请人 |
UNITED MICROELECTRONICS CORP. |
发明人 |
LIU GUAN-JIUN;CHEN SHIH-CHING;SUNG CHI-JUI;HSU CHUNG-PO |
分类号 |
H01L21/762;(IPC1-7):H01L21/76 |
主分类号 |
H01L21/762 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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