摘要 |
The invention relates to a process for depositing a layer based on a fluorine-containing metal oxide, especially a layer of fluorine-doped tin oxide F:SnO2, on a glass substrate by a chemical vapor deposition technique using at least two precursors, including at least one metal precursor and at least one fluorine precursor. According to the invention, the fluorine precursor consists essentially of nitrogen trifluoride NF3.
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