发明名称 COATING FILM, AND METHOD AND APPARATUS FOR PRODUCTION THEREOF
摘要 PROBLEM TO BE SOLVED: To provide an economical functional thin film and its production method and production apparatus capable of decreasing the liquid quantity necessary to be used for film formation even if a substrate has an irregular and large shape, requiring no care for a pot life of a coating solution, and easy to handle a substrate. SOLUTION: A chlorosilane compound having a fluorocarbon group and defined as general formula ABXn (wherein A is a carbon-containing group; B is Si, Ge, Sn, Ti, or Zr; X is hydrolyzable group; and (n) is 1, 2 or 3) is measured in an amount necessary for one time coating and dropwise titrated on the surface of a substrate 20 having active hydrogen through a nozzle 21 and simultaneously the surface is smeared with the compound by a coating apparatus 22 of such as sponge or a non-woven fabric. Then, dry hot air 23 is blown to and at the same time the surface is smeared with the compound by a coating apparatus 24 of such as sponge or a non-woven fabric to cause isolation reaction between the active hydrogen in the surface of the substrate and the hydrolyzable group of the compound and form covalent bonds. The silane compound molecules are polymerized with one another and fixed.
申请公布号 JP2001137769(A) 申请公布日期 2001.05.22
申请号 JP20000252936 申请日期 2000.08.23
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 MINO NORIHISA;EBISAWA MITSUO;ONO YOSHIAKI;OGAWA KAZUFUMI;ONOE JUNICHI
分类号 B05D1/18;B05C1/02;B05C1/06;B05C5/00;B05C9/14;B05D1/40;B05D3/04;B05D3/10;B05D5/08;B05D7/24;C03C17/28;C03C17/30;C04B41/49;C04B41/84;C09D183/04;C09D185/00;(IPC1-7):B05D1/18 主分类号 B05D1/18
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