发明名称 DEVICE FOR SAVING GAS IN SEMICONDUCTOR MANUFACTURING PROCESS
摘要 PROBLEM TO BE SOLVED: To provide a device for saving gas in a semiconductor manufacture process, which enables reduction of the quantity of consumed gas by enabling the stop of the supply of processing gas while a semiconductor wafer is carried from a load lock chamber to a reactor chamber. SOLUTION: While a semiconductor wafer is carried from a load lock chamber 6 to a reactor chamber 3, the supply of gas not contributing to film growth is cut off, by making use of the electric signal of the timing of the load lock door 7 being opening and the compressed air outputted from an air cylinder 8 for opening the load lock door 7.
申请公布号 JP2001135624(A) 申请公布日期 2001.05.18
申请号 JP19990318408 申请日期 1999.11.09
申请人 MARUYOSHI GIHAN:KK 发明人 OZAKI RYUICHI
分类号 H01L21/31;(IPC1-7):H01L21/31 主分类号 H01L21/31
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