发明名称 |
COATING LIQUID FOR FORMING SILICA-BASED FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a coating liquid for forming a silica-based film not suffering troubles caused by gas evolution in a thermal treatment, having excellent shalf stability and exhibiting excellent planarity sufficient to cope with formation of a fine circuit pattern. SOLUTION: The coating liquid for forming a silica-based film is composed of a solution containing an acid-catalyzed hydrolyzate of a trialkoxysilane in an alkyleneglycol dialkyl ether and comprises a film-forming component which after removing of a solvent exhibits an increase in its weight in the thermogravimetry and has no peak due to an alkoxy group near 3,000 cm-1 in the IR spectrum.
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申请公布号 |
JP2001131479(A) |
申请公布日期 |
2001.05.15 |
申请号 |
JP20000330535 |
申请日期 |
2000.10.30 |
申请人 |
TOKYO OHKA KOGYO CO LTD |
发明人 |
SAKAMOTO YOSHIKANE;HAGIWARA YOSHIO;NAKAYAMA TOSHIMASA |
分类号 |
C09D183/04;(IPC1-7):C09D183/04 |
主分类号 |
C09D183/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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