发明名称 COATING LIQUID FOR FORMING SILICA-BASED FILM
摘要 PROBLEM TO BE SOLVED: To provide a coating liquid for forming a silica-based film not suffering troubles caused by gas evolution in a thermal treatment, having excellent shalf stability and exhibiting excellent planarity sufficient to cope with formation of a fine circuit pattern. SOLUTION: The coating liquid for forming a silica-based film is composed of a solution containing an acid-catalyzed hydrolyzate of a trialkoxysilane in an alkyleneglycol dialkyl ether and comprises a film-forming component which after removing of a solvent exhibits an increase in its weight in the thermogravimetry and has no peak due to an alkoxy group near 3,000 cm-1 in the IR spectrum.
申请公布号 JP2001131479(A) 申请公布日期 2001.05.15
申请号 JP20000330535 申请日期 2000.10.30
申请人 TOKYO OHKA KOGYO CO LTD 发明人 SAKAMOTO YOSHIKANE;HAGIWARA YOSHIO;NAKAYAMA TOSHIMASA
分类号 C09D183/04;(IPC1-7):C09D183/04 主分类号 C09D183/04
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