METHOD FOR REPAIRING PHOTOMASK

摘要

PURPOSE: A method for repairing a photomask is provided to improve capacity of a semiconductor chip, by reducing a repair fail and manufacturing the photomask where defects are decreased. CONSTITUTION: A repair monitoring pattern is formed in a photomask region not used in a process for manufacturing a semiconductor device to eliminate an align error of laser beam used in a repair process of a photomask. Shift, size and intensity of the laser beam are measure by using the repair monitoring pattern to inspect the align error or a deposition state of a photomask repair apparatus.