| 摘要 |
PURPOSE: An apparatus for forming low pressure in a chamber of equipment for manufacturing a semiconductor is provided to simplify the structure of the apparatus and a control mechanism, by forming a unified controller composed of a pump and a valve which operate to make chamber pressure not greater than a predetermined pressure value approach a target value. CONSTITUTION: A gas line is connected to a process chamber(21). Reaction gas flows in the gas line. A pressure monitoring unit(22) inspects a pressure value inside the process chamber, and converts the pressure value to an electrical signal for transmission. A low pressure inducing part(26) has a low-pressure induction valve(24) and a low-pressure induction pump(25), installed in the gas line. The low pressure inducing part lowers the pressure inside the process chamber to predetermined pressure or less. A low-pressure control part(31) has a low-pressure control pump(30) and a low pressure control valve(29), installed in the gas line. The low-pressure control part operates when the inside pressure becomes lower than the predetermined pressure value, and makes the inside pressure approach a target value. A unified controller(28) controls the pump and valve for controlling pressure of the low-pressure control part. A main controller(23) receives the electrical signal from the pressure-monitoring unit to control the unified controller, and controls the operation of the low pressure inducing part.
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