Method of complementary metal-oxide semiconductor

摘要

A method of fabricating a complementary metal-oxide semiconductor. A semiconductor substrate having a first conductive type region and a second conductive type region is provided. A conductive layer is formed on the substrate. A patterned insulating layer is formed on the conductive layer. A first photoresist layer is formed over the substrate to cover the first region. A portion of the conductive layer on the second region is removed until the substrate is exposed using the insulating layer as a hard mask. A first doping process is performed to the substrate using the first photoresist layer as a mask. The first photoresist layer is removed. A second photoresist layer is formed to cover the second region. A portion of the conductive layer in the first region is removed until the substrate is exposed using the insulating layer as a hard mask. A second doping process is performed on the substrate using the second photoresist layer as a mask. The second photoresist layer is removed.