| 发明名称 |
Radiation-sensitive resin composition |
| 摘要 |
A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymono-carboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage) and is suited for use as a resist for making integrated circuits.
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| 申请公布号 |
US6228554(B1) |
申请公布日期 |
2001.05.08 |
| 申请号 |
US19990414724 |
申请日期 |
1999.10.08 |
| 申请人 |
JSR CORPORATION |
发明人 |
HOSAKA YOSHIHIRO;NOZUE IKUO;TAKATORI MASASHIGE;HARITA YOSHIYUKI |
| 分类号 |
G03C1/00;C08K5/28;C08L61/06;G03C1/72;G03F7/004;G03F7/008;G03F7/022;H01L21/027;(IPC1-7):G03F7/023 |
主分类号 |
G03C1/00 |
| 代理机构 |
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