发明名称 Photosensitive material scan-exposure method and photosensitive material exposure apparatus
摘要 In a photosensitive material exposure apparatus in which a plurality of rows of photosensitive materials can be subjected to scan-exposure, in a case in which there is only one row of a photosensitive material, scanning is not wasted and exposure time is reduced. Images are exposed by a single scan exposure system in which the column direction of a photographic printing paper (P) is a main scanning direction and a direction orthogonal to the column direction is a sub-scanning direction. In case of single row exposure, scan-exposure is effected only on a necessary row. Accordingly, exposure time can be reduced.
申请公布号 US6229594(B1) 申请公布日期 2001.05.08
申请号 US19980050069 申请日期 1998.03.30
申请人 FUJI PHOTO FILM CO., LTD. 发明人 INOUE SEIICHI
分类号 G03B27/50;B41J2/47;G03B27/32;H04N1/10;H04N1/113;H04N1/203;(IPC1-7):G03B27/48;G03B27/52 主分类号 G03B27/50
代理机构 代理人
主权项
地址