发明名称 |
Photosensitive material scan-exposure method and photosensitive material exposure apparatus |
摘要 |
In a photosensitive material exposure apparatus in which a plurality of rows of photosensitive materials can be subjected to scan-exposure, in a case in which there is only one row of a photosensitive material, scanning is not wasted and exposure time is reduced. Images are exposed by a single scan exposure system in which the column direction of a photographic printing paper (P) is a main scanning direction and a direction orthogonal to the column direction is a sub-scanning direction. In case of single row exposure, scan-exposure is effected only on a necessary row. Accordingly, exposure time can be reduced.
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申请公布号 |
US6229594(B1) |
申请公布日期 |
2001.05.08 |
申请号 |
US19980050069 |
申请日期 |
1998.03.30 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
INOUE SEIICHI |
分类号 |
G03B27/50;B41J2/47;G03B27/32;H04N1/10;H04N1/113;H04N1/203;(IPC1-7):G03B27/48;G03B27/52 |
主分类号 |
G03B27/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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