发明名称 INTERCONNECTION LAYOUT STRUCTURE OF SEMICONDUCTOR DEVICE
摘要 <p>PURPOSE: An interconnection layout structure of a semiconductor device is provided to prevent a process defect generated after an interconnection layer is formed, by changing the layout structure of the interconnection layer to increase an interval between the interconnection layers without an additional process. CONSTITUTION: An interconnection layout structure of a semiconductor device has a plurality of interconnection layers which are adjacent to each other. At least one convexo-concave part(102) is designed in a portion on a plane of the interconnection layer. The line width of the interconnection layer is changed by the convexo-concave part.</p>
申请公布号 KR20010035610(A) 申请公布日期 2001.05.07
申请号 KR19990042257 申请日期 1999.10.01
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HONG, WON CHEOL;LEE, GWON JAE
分类号 H01L27/10;H01L23/528;(IPC1-7):H01L27/10 主分类号 H01L27/10
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