| 摘要 |
PURPOSE: A method for cleaning a substrate is provided to eliminate particles adhered to a side portion of a substrate, by using a side cleaning brush in contact with the side portion of the substrate and a spraying unit for spraying high pressure cleaning water containing ultrasonic waves. CONSTITUTION: A side cleaning brush(32) is rotated to eliminate particles adhered to a side portion of a substrate(30), disposed to contact the side portion of the substrate. Upper and lower cleaning brushes(34,36) are rotated to eliminate particles adhered to upper and lower surfaces of the substrate, disposed to contact the respective upper and lower surfaces of the substrate. Cleaning water containing ultrasonic waves is sprayed into the side portion of the substrate at high pressure to clean the side portion of the substrate.
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