USING BLOCK COPOLYMERS AS SUPERCRITICAL FLUID DEVELOPABLE PHOTORESISTS

摘要

Block copolymers containing block having pendant fluoro-containing groups and block having pendant hydrolyzable ester containing groups is developed at lower pressures and temperatures than random copolymers of the same monomers. Where the block with ester groups is from polymerization of 2-tetrahydropyranyl methacrylate and the block with pendant fluoro-containing groups is from polymerization of perfluoroalkyl methacrylate or semifluorinated alkyl methacrylate, resolution of sub 0.3 mu m features is enabled.