| 摘要 |
The invention relates to a device for treating a receptacle (30) with a low pressure plasma, comprising at least one treatment station (14) consisting of a fixed cavity (32) which is connected by a vacuum circuit (74) to a depressurizing source, and wherein said treatment station (14) consists of a moveable cover (34) provided with means for supporting (54) the receptacle (30) in such a way that the receptacle in introduced into the cavity (32) by displacing the cover (34). The invention is characterized in that the cover (34) comprises a connecting channel (64) which enables the cavity (32) to communicate with a fixed end (69) of the vacuum circuit when the cover (34) is in a position in which the cavity is hermetically sealed.
|
