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发明名称
Herstellverfahren für eine Siliziumdioxid-Schicht auf einer Topographie sowie eine nach diesem Verfahren hergestellte Siliziumdioxidschicht
摘要
申请公布号
DE19600305(C2)
申请公布日期
2001.05.03
申请号
DE19961000305
申请日期
1996.01.05
申请人
SIEMENS AG
发明人
TOEBBEN, DIRK;GROTELOH, DOERTHE;SPINDLER, OSWALD;ROGALLI, MICHAEL
分类号
B32B9/00;H01L21/31;H01L21/316;H01L21/768;(IPC1-7):C23C26/00;C23C16/40
主分类号
B32B9/00
代理机构
代理人
主权项
地址
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