发明名称 METHOD AND APPARATUS FOR MONITORING PROCESS EXHAUST GAS, SEMICONDUCTOR-MANUFACTURING DEVICE, AND METHOD AND SYSTEM FOR MANAGING SEMICONDUCTOR-MANUFACTURING DEVICE
摘要 <p>Process exhaust gas is collected to analyze its components using a Fourier transform spectroscope (FT-R) (26). The results of analysis are compared with the reference values derived from a process carried out under reference process conditions. If the amount of any analyzed component exceeds a predetermined range with respect to the reference values, a signal indicative of trouble in the process is produced. Alternatively, the process conditions may be automatically controlled instead of producing such a signal indicative of trouble.</p>
申请公布号 WO2001031693(P1) 申请公布日期 2001.05.03
申请号 JP2000007457 申请日期 2000.10.25
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