发明名称 CLEANER FOR LITHOGRAPHY
摘要 PROBLEM TO BE SOLVED: To obtain a cleaner for lithography having increased solvent power to a resist, etc., and high safety. SOLUTION: The cleaner for lithography uses one or more solvents selected from the group comprising 1,3-propanediol alkyl ethers, 1,3-propanediol alkyl ether acetates, 1,3-propanediol dialkyl ethers and 1,3-propanediol diacetate optionally in combination with a 1-4C alcohol or propylene glycol methyl ether acetate.
申请公布号 JP2001117242(A) 申请公布日期 2001.04.27
申请号 JP19990292890 申请日期 1999.10.14
申请人 DAICEL CHEM IND LTD 发明人 MIYAKE HIROTO;KOYAMA HIROSHI;FUJITA AKIHIKO
分类号 H01L21/027;C11D7/26;C11D7/50;G03F7/42;(IPC1-7):G03F7/42 主分类号 H01L21/027
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